NFP Measurement Optical System
VIS-BE-SP02
To understand the characteristics of light from semiconductor lasers and optical fibers, it is necessary to measure the beam profile near the emission end (NFP: near field pattern) and the beam profile at a sufficiently distant location from the emission end (FFP: far field pattern).
This optical system is an NFP measurement optical system option using a microbeam diameter measurement optical system.
Main Components
- Digital Gauge
- XYZ Manual Stage (with Differential Micrometer)
- CCD Camera
- Imaging Lens
- ND Filter switchable
- Objective Lens
- Φ5.6 LD Mount
- LD Socket Cable (0.8 m)
- Coarse Stage for retraction during LD replacement
Product Specifications
Beam Profiler
| item | specification |
| Wavelength range | 400 – 1100 nm |
| Optical resolution | 0.6 μm (theoretical value at wavelength 790 nm) |
| Field of view | Approx. 76 × 57 μm |
| Optical system magnification | 82x (at wavelength 808 nm) |
| Optical system N.A. | 0.8 |
| Working distance | 3.0 mm |
| Pixel resolution | 56.0 nm (measured value at a wavelength of 808 nm) |
| Maximum input power | 10 mW |
| Accessories | ND Filter 2 sheets (OD1.2, OD3.2) switchable |
Stage
| item | specification |
| Movable axes | 3 axes (XYZ) |
| Actuator | Manually driven micrometer |
| Movable range | Coarse adjustment: 4 mm, Fine adjustment: 300 μm |
| Displacement | Coarse adjustment: 500 μm, Fine adjustment: 50 μm |
| Scale resolution | Coarse adjustment: 5 μm, Fine adjustment: 0.5 μm |
Digital Gauge
| item | specification |
| Measurement range | 5 mm |
| Min. resolution | 0.1 μm |
| Accuracy (at 20℃) | 1 μm p-p |
Appearance drawing
